Synthesis of Hibiscus tiliaceus L. flower based-Organic Photoresist for Patterning using X-ray and UV Exposure
Sutikno*, Eva Amellia Defi
Advanced Composite Laboratory, Physics Department, Faculty of Mathematics and Natural Sciences, Universitas Negeri Semarang
Sekaran Gunung Pati Kota Semarang Jawa Tengah, Indonesia, 50229
*Email: smadnasri[at]yahoo.com
Abstract
The purpose of this research is to characterize Hibiscus tiliaceus L. flowers for green photoresist application. As an organic material, it is expected become an alternative to substitute chemicals have been used to date in it’s synthesis process. This research was designed in four steps, namely flower extraction, characterization of thin films of extracted flower liquid, photoresist fabrication, and characterization of photoresist thin films. The liquid mass fraction of Hibiscus tiliaceus L. flowers was optimized in the range of 10-50% using distillation method. The ocean optic Vis-NIR USB 4000 and Perkin Elmer Frontier FT-IR were used to investigate their optical properties and while Digital CCD Microscope MS-804 Scopeman was used to observe their microstructures. The electrical properties were studied using I-V Meter Elkahfi 100. The photoresist sensitivities were determined through UV and X-ray exposures on their surfaces and the simple patterns were designed for this work. The manufactured organic photoresist matched on the absorbance in wavelength range of 350-1050 nm with the highest absorbance value of 0,3.
Keywords: Epoxy; Hibiscus tiliaceus L.; Photoresist; Photosensitivity
Topic: Functional Materials