SURFACE TEXTURING OF CARBON BASED THIN FILM BY MEANS OF A HIGH DENSITY PLASMA OXIDATION
Dionysius J. D. H. Santjojo, Sukma W. Fitriani, Masruroh, Setyawan P. Sakti

Department of Physics, Faculty of Mathematics and Natural Sciences and
Collaborative Research Center for Advanced System and Material Technology,
Brawijaya University Indonesia

Abstract

Surface texturing of carbon based thin film such as amorphous carbon or diamond like carbon (DLC) is the key technology in the development of functional surface for many kinds of sensors. This study explored the possibilities of processing the carbon film’s surface by means of plasma oxidation to produce effective textures. A high density oxygen plasma was generated by a combination of RF and DC power in a vacuum chamber. The high density plasma was applied selectively onto the surface of a DLC film via a printed mask lithography technique. Circular dots with the diameter of 25 μm, 50 μm, and 100 μm were printed on the DLC film. Oxidation reaction was expected on the exposed surface, i.e. the area surrounded the dots. The results show the oxidation effectively removed the DLC on the unmasked area producing 3D cylindrical patterns. The plasma processing which was carried out for 2 hours was monitored and diagnosed using an optical emission spectroscopy (OES). The oxidation was controlled by atomic oxygen which was the dominant species observed in the plasma. The removal (etching) rate was 9μm/h with 91%, 98% and 99% pattern accuracy related to the larger diameter studied in this work. Observations using a Raman spectroscopy confirmed that the printed mask effectively protects the DLC from the etching process and other indirect processes.

Keywords: oxygen plasma, RF-DC plasma, oxygen etching, diamond-like carbon, surface-texturing, high density plasma

Topic: Synthesis and Characterization Techniques

Link: https://ifory.id/abstract-plain/PuHQz6XLr7Wj

Web Format | Corresponding Author (Dionysius Joseph Djoko Herry Santjojo)