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The Influence of Plasma Electrolytic Polishing on Surface Roughness and Antibacterial Properties for Ti-6Al-4V Orthopedics Implant
Nurul Ilmaniar (a), Sugeng Supriadi (a*), Bambang Suharno (a), Callista Fatima Larasati (a)

University of Indonesia
(a) Department of Metallurgical and Materials Engineering, Faculty of Engineering, Universitas Indonesia, Beji, Depok, 16424, Indonesia
*sugeng[at]eng.ui.ac.id


Abstract

Ti-6Al-4V alloy is a common material for orthopedic implant due its high strength-to-weight ratio, corrosion resistance, and biocompatibility. Surgical intervention is required to introduce implant into the body, but it comes with risk of biomaterial associated infection (BAI) or periprosthetic joint infections (PJI). Biomaterial associated infection and periprosthetic joint infections are associated with the presence of bacteria on implant surfaces where they produce biofilm and eventually lead to loosening and implant failure. Treatments for both infections are costly since they require additional surgery to reduce infections and remove biofilm. Surface-modified implants have been introduced with minimum surface roughness to prevent such infections. A key feature is nano-scaled topography with a size of 1-100 nm which minimize bacterial attachment as the initial stage of BAI and PJI. This work aims to study the use Plasma Electrolytic Polishing, an electrochemical machining using high voltage and environmentally friendly electrolyte, to produce low roughness and nano-scaled topography on implant surfaces. Each workpiece is polished in electrolyte comprised of phosphoric acid, sodium perchlorate, and hydrofluoric acid using DC power supply with voltage of 180-400 V. Surface profile of polished workpiece is observed using AFM and SEM whereas the antibacterial properties are tested using the method of disk-diffusion assay.

Keywords: Plasma Electrolytic Polishing, Ti-6Al-4V Implant, Antibacterial properties, Surface roughness, Biofilm inhibition

Topic: Materials Science

Link: https://ifory.id/abstract/qzeANZGVx3mv

Conference: Broad Exposure on Science and Technology (BEST 2019)

Plain Format | Corresponding Author (Nurul Ilmaniar)

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